Ultra-High Purity Gases: Greenox supplies a range of ultra-high purity gases like nitrogen, oxygen, argon, hydrogen fluoride, and various dopant gases. These gases are essential for:

• Chemical Vapor Deposition (CVD): Precisely depositing thin film layers on silicon wafers, forming the foundation of electronic circuits.

• Etching: Removing unwanted material during chip patterning with minimal damage to underlying layers.

• Oxidation: Creating a thin oxide layer on the silicon surface for transistors and other components.

• Ion Implantation: Doping the silicon with specific elements to control its electrical properties.

Inert Atmospheres: Greenox provides nitrogen and helium for creating inert atmospheres during display panel assembly, preventing oxidation and contamination that can affect performance and lifespan.

Speciality Gas Mixtures: Greenox offers customized gas mixtures for specific display technologies, optimizing processes like:

• Sputtering: Depositing thin film layers for electrodes and other display components.

• Gettering: Removing impurities within the display panel to ensure long-term stability.

Inert Gas Purging: Greenox supplies nitrogen for purging air and moisture from electronic components before encapsulation, preventing corrosion and ensuring long-term reliability.

Leak Detection: Greenox offers high-purity helium for detecting leaks in sealed electronic components using highly sensitive leak detection equipment.