Solar
Solar Energy Solutions by Greenox Gases
Advanced Gas Technologies for Photovoltaic Manufacturing & Energy Storage
Greenox Gases delivers precision-engineered gas solutions that enhance solar panel production efficiency, improve energy storage performance, and support next-generation photovoltaic technologies.
The solar industry uses gases like SiH₄, N₂, O₂, H₂, Ar, He, NH₃, CO₂, NF₃, SF₆, HF for wafer manufacturing, thin-film deposition, doping, passivation, coatings, cleaning, and leak detection, making them essential to high-efficiency solar panels.

Core Solar Manufacturing Solutions
1. Silicon Material Production
Polysilicon Refinement:
- Ultra-pure hydrogen (99.99995%) for Siemens process
- High-purity chlorine (99.999%) for trichlorosilane synthesis
- Argon blanket gases (99.9999%) for crystal growth
2. Wafer & Cell Fabrication
Crystal Growth Atmospheres:
- Controlled oxygen/nitrogen mixes for furnaces
- Dopant gases for p-type/n-type silicon
Surface Treatment:
- Texturing etch gases
- Anti-reflective coating precursors
3. Thin Film Deposition
PECVD Processes:
- Silane mixtures (99.9999%)
- Ammonia-based nitride formulations
Sputtering:
- Reactive oxygen/nitrogen for TCO layers
- High-density plasma gases
Solar Module Production Support
1. Encapsulation & Lamination
- Nitrogen purge systems (99.999%) for EVA curing
- Moisture-control atmospheres for back sheet sealing
2. Frame Assembly
- Laser welding gas mixtures
- Aluminum anodizing protection gases
3. Quality Testing
- Electroluminescence inspection environments
- PID testing atmospheres
Energy Storage Integration
1. Battery Production
- Dry room atmosphere control (-50°C dew point)
- Electrolyte filling environments
- Cell sealing gases
2. Hydrogen Solutions
- Electrolyzer gases for solar-to-hydrogen
- Fuel cell testing mixtures
Solar-Grade Gas Specifications
Application |
Gas Type |
Purity |
Key Parameter |
Ingot Growth |
Argon |
99.9999% |
O₂ <0.5 ppm |
Diffusion |
POCl₃ |
99.999% |
Metal ions <1 ppb |
PECVD |
SiH₄/NH₃ |
99.9995% |
Particles <0.1μm |
Lamination |
N₂ |
99.999% |
H₂O <3 ppm |




